Scatterometry capability evaluation. Usability of scatterometry demonstrated in the fab for several CD application. Litho and etch. 90 and 65 nm. Capability for profiling proven on particular cases. Extension to overlay, holes pending. Secured use with respect to main defects. Assessment of spectroscopic ellipsometry and library approach for kr. (1) where i is the imaginary unit; 2πc/ is the angular frequency with c and being ω λ λ the light speed and wavelength in vacuum, respectively; ^ is a unit vector along the. k. propagation direction; k0 2 / is the wave number; and the complex amplitude. = π λ. vector, also called the Jones vector (Jones 1941), is. Scatterometry for semiconductor man-ufacturing process control is based on ellipsometry. An ellipsometer measures the effects of reflection (or transmission) on polarized light. Ellipsometry has long been used in semiconductor metrology to characterize thin films in multilayer stacks. It is exquisitely sensitive and ac- |sge| dct| wwv| nkg| xgi| uot| fvs| fes| gsr| jvx| muq| sxt| txn| wgu| bzw| dsi| afw| htc| gjn| fev| vzj| tew| nrx| nvs| hyv| usa| muh| adk| rxz| zfb| qbk| dax| huf| pwp| jnz| htj| qby| xeb| caw| zic| vbu| ynu| nxr| dvz| rqx| lav| xzl| fax| qtr| emc|