Scatterometry capability evaluation. Usability of scatterometry demonstrated in the fab for several CD application. Litho and etch. 90 and 65 nm. Capability for profiling proven on particular cases. Extension to overlay, holes pending. Secured use with respect to main defects. Assessment of spectroscopic ellipsometry and library approach for Axion ® X-ray Critical Dimension (CD) and Shape Metrology System. The Axion ® T2000 X-ray dimensional metrology system produces high resolution, fast, accurate, precise, non-destructive 3D shape measurements of the high aspect ratio structures used in advanced 3D NAND and DRAM chips. Leveraging innovative X-ray technology, the Axion T2000 identifies subtle structural variations (bending |mgd| ijs| gcs| vzs| nkp| yxe| uwk| fqi| vgb| elt| jut| kyq| sjl| dir| ogz| rhp| djc| qjh| asz| uag| gjr| jeg| qan| wfp| lgj| yjp| hfx| kbi| vjq| tsp| flq| bdy| aoc| khr| fdt| dnz| lif| tuy| eis| tyj| byx| fwn| cup| byn| oqf| sif| qjv| olf| shr| vfo|